skip header
(Site name)Hitachi kokusai Electric Inc.


NewsContact Us
starting of primary navigationHomeProduct InformationInvestor RelationsCorporate Informationending of primary navigation To Japanese site


300mm Single Wafer LPCVD System

starting of main content

 
For 300mm wafers
 
ZESTONE-VII(B) DJ-1207S

Hitachi Kokusai Electric developed Zestone-VII series single wafer Diffusion/LPCVD systems for processing 300 mm wafer. The Zestone VII series offers our customers who have moved to a single wafer configuration the expertise in thermal processing and low cost of ownership (CoO) that is expected from Hitachi Kokusai products. The combination of chamber size and Hitachi Kokusai's controllers allows for excellence in specialty processes for DRAM applications requiring selective HSG, TaO5, PH3-Anneals. Hitachi Kokusai has offered single-wafer thermal solutions since 1994 where they are currently being utilized for R&D, prototype and mass production lines of semiconductor devices in the twenty first century.
Phot(300mm Single Wafer LPCVD System)
 

Specifications

 
 
  ZESTONE-VII(B)
Wafer Diameter(mm) 300
Temperature Stability (degree) <plas_minus0.5
Cassette Type FOUP(for 13 or 25 wafers)
Number of Cassette I/O 2
Tube Controller CX-3000(Color TFT)
Dimensions(W×D×H)(mm) 2000×3000×2800
 

Process Applications

 
  Selective HSG, PH3-Anneal, Doped/Undoped-Poly-Si, Doped/Undoped-SiGe-Poly, Si3N4, (New film processes are under development.)
 

Main Features

 
 
  • Substantially reduced thermal budget comparing to conventional vertical batch systems
  • Reduced cycle time
  • Supports formation of Hi-k dielectric films for DRAM capacitor and logic gate dielectric
  • Integrated processing for gates stack and DRAM capacitor formation
  • Excellent yield and film thickness uniformity by optimized process conditions and clean air flow in loading area of the system.
  • Native oxide free process by oxygen and moisture free load lock.
  • Improved throughput with dual wafer processing.
  • Maximum system uptime by self-cleaning capability.
  • Simple structure for easy maintenance (a reactor chamber can be easily and safely inserted and extracted)
  • SEMI standard compliant wafer I/O stage
  • Supports FOUP type cassettes
  • User friendly GUI tube controller (CX3000 series) which supports process logging data analysis capability.
  • SECS/GEM compatibility for factory automation.
 

Typical Process Performance

 


* ZESTONE is a registered trademark of Hitachi Kokusai Electric Inc.
ending of main content

starting of secondary navigation
Wireless Communications and Information Systems

Broadcasting and Video Systems

Semiconductor Manufacturing Systems
starting of sub category
New Products

Semiconductor System
starting of 2nd sub category
300mm Single Wafer LPCVD System

200mm Vertical Diffusion/LPCVD Systems

200mm Load Lock Vertical Diffusion/LPCVD Systems

Silicon Epitaxial Growth System
ending of 2nd sub category

Block Control System

Toyama Works

Training Center
ending of secondary navigation


News
News Releases
Exhibition information

Contact Us
Semiconductor Manufacturing Systems

page top

 
starting of footer  | Site Map | Using the site |ending of footer

© Hitachi Kokusai Electric Inc. 2000, 2005. All rights reserved.