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Single Wafer Processing System

Hitachi Kokusai's Plasma Nitridation/Oxidation system, MARORA and Resist Dry Strip System, TΛNDUO support stringent new process technology requirements for advanced memory and logic devices

  • MARORA -Single Wafer Plasma Nitridation / Oxidation System

    • MARORA offers the best gate dielectric film solution for next generation advanced logic and memory devices. This tool uses a unique "modified magnetron typed (MMT)" plasma source. MMT technology produces both high density plasma and low electron temperature (<1eV) enabling a very uniform nitridation process free of plasma damage.

  • TΛNDUO -Single Wafer Plasma Dry Strip System

    • TΛNDUO offers dramatically improved throughput using a totally redesigned platform. Incorporating Hitachi Kokusai's production-proven Lambda Series plasma source, TΛNDUO offers an ultra high speed ashing process solution with minimum plasma damage and lowest CoO, compared with other available solutions.