Hitachi Kokusai's new epitaxial system offers the SiGe community a cost-effective batch solution designed for increasing volume production.
Employing the field-proven, load-lock platform, Hitachi Kokusai provides the film and crystal qualities expected in advanced device design while high-throughput with 100 wafer batch size. Our ability to process at low temperatures provides the second critical factor in maintaining a low Cost of Ownership.
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