QUIXACE-L/L is Hitachi Kokusai's new platform for vertical, batch LOAD-LOCK processing of 300 mm wafers. The QUIXACE-L/L offers throughput enhancements on core diffusion and LPCVD technologies through advances in temperature control, wafer handling automation, reactor purge, and temperature ramping.
QUIXACE-L/L is the best configuration for applications that require strict oxide-control for sensitive films such as contact poly-silicon layer, capacitor, ultra-thin gate-oxides and Cu anneal.
Incorporating over 20 years of vertical, batch technology into one platform, Hitachi Kokusai Electric is proud to offer the QUIXACE as the new platform for today's manufacturing environment and the solution tomorrow's challenges.
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