MARORA is the best solution for gate insulation films for the 65nm design rule of logic devices and flash memory applications.
MMT Plasma Nitridation System uses a unique "modified magnetron typed (MMT)" plasma source. MMT plasma technology's high density and low electron temperature (<1eV) provide high uniformity nitridation process without damage to substrates.><1eV) provide high uniformity nitridation process without damage to substrates.
MMT : Modified Magnetron Typed
Features
No Plasma Damage
Wide Range Nitrogen Concentration Control
Multi-Process Single Chamber (In-situ Gate Oxide & Nitridation)
Bridge Tool Concept (200mm/300mm)
* MARORA is a registered trademark of Hitachi Kokusai Electric Inc.
