ALDINNA is innovative and unique process tool that employs a mass production configuration along with advanced plasma technologies.
Utilizing an established vertical batch platform, Hitachi Kokusai optimized the reactor design and gas switching speeds to enable a uniform precursor distribution that is essential for an ALD process and superior film qualities. Customer's interested in a low cost of ownership (CoO) want to maintain a batch environment for the ALD process as it is inherently a slow process depositing one atomic-layer at a time.
Features
Low Temperature Deposition
300mm Wafer Process Capable
High Throughput by Batch Processing
Process Applications : Nitride, Al203 (and others in development)
* ALDINNA is a registered trademark of Hitachi Kokusai Electric Inc.
