Batch High Temperature Anneal Processing System

Batch SiGe/Si Epitaxial Growth System

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Batch SiGe/Si Epitaxial Growth System

Process Applications

Silicon Epitaxy
Silicon Germanium Epitaxy

Hitachi Kokusai's new batch epitaxial system offers a cost-effective solution to SiGe/Si community. Employing a field-proven vacuum load lock platform, this tool produces a high crystalline quality epitaxial film which meets advanced device requirements while maintaining high throughput and low cost of ownership.

Features

High Productivity Batch Process
Low Temperature EPI Process
300mm Wafer Capable
High Productivity and Reliability based on field proven batch platform

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- Batch Processing System
  - QUIXACE Batch Thermal Process System for 300mm Wafers
  - Advanced Batch Thermal Process Technology
  - Batch High Temperature Anneal Processing System
  - Batch SiGe/Si Epitaxial Growth System
  - VERTRON Batch Thermal Process System for 200mm Wafers
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