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VERTRON Batch Thermal Process System for 200mm Wafers

VERTRON Batch Thermal Process System for 200mm Wafers

Process Applications

  • LP CVD
  • Oxidation
  • Anneal (High Temp. / Low Temp.)
  • Diffusion

Hitachi Kokusai's Vertron-III series Batch Diffusion/LPCVD systems have been developed specifically for processing 200mm wafers predominantly used in high-volume semiconductor device manufacturing. The Vertron-III platform offers solid reliability and superior cost of ownership (CoO).

Features

  • High throughput, large batch (150Wafers)
  • Reduced cycle time, optional fast ramp heater element which also lowers thermal budget
  • Vacuum load lock available for oxygen and moisture sensitive process (lower oxygen & H2O concentration). (Option)
  • User friendly GUI main system controller