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Hitachi

Hitachi Kokusai Electric Inc.

TΛNDUO

Process Applications

TΛNDUO

  • Resist Strip
    • Bulk Photoresist Strip
    • High-Dose Implant Strip
  • Low Temperature Anneal

TΛNDUO - Single Wafer Plasma Dry Strip System

TΛNDUO offers dramatically improved throughput using a totally redesigned platform. Incorporating Hitachi Kokusai's production-proven Lambda Series plasma source, TΛNDUO offers an ultra high speed ashing process solution with minimum plasma damage and lowest CoO, compared with other available solutions.

Features

  • High throughput
  • High rate, damage free ashing with helical resonator type plasma source
  • Low Contamination
  • Compact Footprint
  • Other applications include high throughput single wafer annealing