Skip to main content

Hitachi

Hitachi Kokusai Electric Inc.

MARORA

Process Applications

MARORA

Plasma Nitridation

  • Oxide Nitridation

Plasma Oxidation

  • Gate Dielectric
  • Selective Oxidation
  • Anisotropic Oxidation

MARORA - Single Wafer Plasma Nitridation / Oxidation System

MARORA offers the best gate dielectric film solution for next generation advanced logic and memory devices. This tool uses a unique "modified magnetron typed (MMT)" plasma source. MMT technology produces both high density plasma and low electron temperature (<1eV) enabling a very uniform nitridation process free of plasma damage.

Features

  • High Throughput: Doubled productivity compared with conventional solutions
  • MMT Plasma Source: Excellent uniformity and very low electron temperature plasma at wafer surface (~1eV)
  • Wide Process Temperature Range: New high temperature heater
  • Expanded Process Applications: Selective oxidation (oxidize silicon without metal oxide formation)