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Hitachi

Hitachi Kokusai Electric Inc.

Batch SiGe/Si Epitaxial Growth System

Process Applications

QUIXACE

  • Silicon Epitaxy
  • Silicon Germanium Epitaxy

Hitachi Kokusai's new batch epitaxial system offers a cost-effective solution to SiGe/Si community. Employing a field-proven vacuum load lock platform, this tool produces a high crystalline quality epitaxial film which meets advanced device requirements while maintaining high throughput and low cost of ownership.

Features

  • High Productivity Batch Process
  • Low Temperature EPI Process
  • 300mm Wafer Capable
  • High Productivity and Reliability based on field proven batch platform