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Hitachi

Hitachi Kokusai Electric Inc.

Batch High Temperature Anneal Processing System

Process Applications

Batch High Temperature Anneal Processing System

  • High temperature Anneal
  • Very high temperature Anneal(>1300℃)

This tool offers the best manufacturing solution for high-quality silicon substrate fabrication and high temperature device manufacturing processes. 1350℃ is a typical temperature for high temperature annealing processes. Crystalline slip lines are easily induced on 300mm wafers processed at such high temperatures. This tool produces slip-free wafers at very high throughputs.

Features

  • Slip Free even at 1350℃
  • 300mm Wafer Capable
  • High Throughput Batch Processing
  • Ultra-Clean Design resulting in Low Metallic Contamination